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Apparatus suitable for plasma surface treating and process for

preparing membrane layers

Citation for published version (APA):

Schuurmans, H. J. A., Werner, J., Schram, D. C., Kroesen, G. M. W., & Shell International Research (NL) (1988). Apparatus suitable for plasma surface treating and process for preparing membrane layers.

Document status and date: Published: 01/01/1988 Document Version:

Publisher’s PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:

• A submitted manuscript is the version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.

• The final author version and the galley proof are versions of the publication after peer review.

• The final published version features the final layout of the paper including the volume, issue and page numbers.

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EP0295752B1

Publication Title:

Apparatus suitable for plasma surface treating and process for preparing

membrane layers

Abstract:

The invention relates to an apparatus suitable for plasma surface treating (e.g.

forming a membrane layer on a substrate) which comprises a plasma generation

section (2) which is in communication via at least one plasma inlet means (4)

(e.g. a nozzle) with an enclosed plasma treating section (3) which is operable at

a lower pressure than the plasma generation section (2), and wherein the plasma

treating-section (3) is in communication with inlet means (10) for a fluid (e.g.

polymerizable) reactant. The invention furthermore relates to a process for

preparing membrane layers employing such an apparatus.

---Data supplied from the esp@cenet database - http://ep.espacenet.com

This Patent PDF Generated by Patent Fetcher(TM), a service of Patent Logistics, LLC

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