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(1)

Department of Electrical Engineering (ESAT) MICAS

Displacement

measurement

(2)

Department of Electrical Engineering (ESAT) MICAS

Displacement

measurement

(3)

Department of Electrical Engineering (ESAT) MICAS

Displacement

measurement

Setup: with micrometer:

Hysteresis

up to 20 m!

1.4 V/mm in

most sensitive

part

(4)

Department of Electrical Engineering (ESAT) MICAS

Displacement

measurement

(5)

Department of Electrical Engineering (ESAT) MICAS

Displacement

measurement

Higher precision setup: mounted on mitutoyo:

(6)

Department of Electrical Engineering (ESAT) MICAS

Displacement

measurement

Higher precision setup: mounted on mitutoyo:

(7)

Department of Electrical Engineering (ESAT) MICAS

O-rings: wafer2

(8)

Department of Electrical Engineering (ESAT) MICAS

(9)

Department of Electrical Engineering (ESAT) MICAS

O-rings

FIB pictures:

(10)

Department of Electrical Engineering (ESAT) MICAS

O-rings

(11)

Department of Electrical Engineering (ESAT) MICAS

O-rings

Jenatech pictures: sliced oring

curvature can be an

indication of the etch profile

but: non-perpendicular

(12)

Department of Electrical Engineering (ESAT) MICAS

Orings: wafer2

Diameter measurements: (mitutoyo)

 mask

 Si top

 Si

bottom

underetch top –bottom

994 

1040 

1063 

23 

23 

1016 

1067 

1161 

25 

94 

1073 

1192 

119 

1112 

1241 

129 

1116 

1250 

134 

1120 

1231 

111 

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