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UvA-DARE is a service provided by the library of the University of Amsterdam (https://dare.uva.nl)

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Light in strongly scattering semiconductors - diffuse transport and Anderson

localization

Gomez Rivas, J.

Publication date

2002

Link to publication

Citation for published version (APA):

Gomez Rivas, J. (2002). Light in strongly scattering semiconductors - diffuse transport and

Anderson localization.

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Contents s

11 Introduction 9

1.11 Single scattering 9

1.22 Multiple scattering 10

1.33 Weak localization 12

1.44 Anderson localization 15

1.55 The history of localization 19

1.66 How to localize light 21

1.77 This thesis 22

22 Propagation of light in disordered scattering media 25

2.11 Coherent beam 25

2.22 Diffusive propagation 27

2.2.11 The radiative-transfer equation and the diffusion

approxi-mationn 27

2.2.22 Boundary conditions: internal reflection 28

2.2.33 Angular-resolved transmission 32

2.2.44 Total transmission and reflection 33

2.2.55 Dynamic transmission 37

2.33 Enhanced backscattering 38

2.44 Anderson localization 42

33 Near infrared transmission through powdered samples 47

3.11 Introduction 47

3.22 Sample preparation 49

3.33 Experimental set-up 51

3.44 Total transmission through Si samples 52

3.55 Total transmission through Ge samples 55

3.66 Discussion 59

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88 CONTENTS 44 Midinfrared transport of light in Ge powders close to the localization

transitionn 61

4.11 Introduction 61 4.22 Sample preparation 63 4.33 Static measurements 65

4.3.11 Coherent beam transmission 65 4.3.22 Total transmission and reflection 67

4.3.33 Discussion 72 4.44 Time-resolved speckle interferometry 73

4.55 Photoacoustic spectroscopy 77

55 Porous GaP: formation and optical properties 81

5.11 Introduction 81 5.22 Optical experimental techniques 83

5.33 Pore formation by anodic etching 84 5.3.11 Current-potential characteristics 85 5.3.22 Formation of porous layers 87 5.44 Optical absorption in anodically-etched GaP 90

5.55 Removal of the top layer by photochemical

etchingg 91 5.66 Scattering strength versus doping concentration and etching potential 94

5.77 Increase of the scattering strength by chemical etching 98

5.88 Discussion 101

Appendixx A: energy density coherent potential approximation. 105 Appendixx B: extrapolation length with an absorbing layer. 107

Listt of symbols 109 Listt of abbreviations 113 Referencess 115 Summaryy 125 Samenvattingg 129 Resumenn 133 Dankwoordd 137

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