Physics@Veldhoven 2019
Comparison of Sputtering of Transition Metals by Reactive Ion Bombardment
Parikshit Phadke, Marko Sturm, Robbert van de Kruijs, Fred Bijkerk
Industrial Focus Group XUV Optics, Mesa + Institute for Nanotechnology, University of
Twente, Enschede
Mass loss or gain in transition metals exposed to energetic particles is relevant to many applications, from thin film processing, to EUV lithography, and fusion research. Understanding the interaction of ions with surfaces near the sputter threshold becomes essential in ascertaining damage to metallic films, whether it’s ‘fuzz’ growth in tungsten, target poisoning in coating technologies or mirror degradation in EUV lithography. We compare the sputtering of transition metals such as Mo, W and Ru under neon, nitrogen and oxygen ion exposure in the energy range of 50-300 eV. Monte Carlo simulations using TRIDYN are performed to evaluate the surface binding energy and composition of the steady state sputtered surface.
